复式二中二连码公开|三中三复式组数表图片|
MaskManufacture
Service
Laser writer
Laser engraving technology
Scanning distance:0.65mm
Scanning mode:Raster
Accuracy: 5nm
E-Beam writer
Electronic beam engraving technology
Scanning distance:depending on the beam spot
Scanning mode:Raster & Vector
Accuracy:depending on the beam spot (approx. 25nm)

*  WUXI CHINA RESOURCES MICROELECTRONICS CO.,LTD MASK FACTORY has developed electronic beam and laser processing technologies and boasts the most advanced UV exposure machine.

CRMF

WUXI DIS Microelectronics Co.,Ltd. is one of the earliest professional enterprises engaged in the production of mask. It owns domestically leading and comprehensive photomask manufacturing equipment, world-class facilities, excellent processes and technologies, strict quality control and information security protection. Persisting in its concept and pursuit of “Creating the value for customers and growing with customers”, CR Micro Mask has been the preferred partner of many IC design companies and wafer manufacturers in China.  

Products
0.18um Stepper mask or bigger
3”x5”UT mask
1:1 Array mask
Copy photomask
Service
Professional customer service
Remote data check
Notification of engraving schedule
Data generation and format conversion

复式二中二连码公开
福彩3d胆码预测 全年无错特围24码网址 时时彩个位必中 云南快乐十分任三口诀 蹦蹦网幸运28投注技巧 捕鱼机1000炮技术打法 时时彩后三750注推波 幸运飞艇稳赢技巧 pk10两面对打法 3d1胆4拖多少钱